“Stable control and efficient design of industrial plasma processes with plasma diagnostics”
For the fifth time, experts in plasma analysis are meeting for a joint workshop to discuss established and new methods for process monitoring of plasma-based coating and etching processes.
The basic idea behind the event is to refresh basic knowledge about plasma and plasma analysis. Three key principles of investigation will kick off the event:
- the analysis of current, voltage and phase
- spectroscopic methods
- probes and mass spectrometry for analysing particles in the gas phase.
The focus will be on both the scientific fundamentals and the industrial application perspective from companies. During the workshop, example scenarios and different investigation methods for sputtering and etching processes will be examined in detail. Process-specific insights based on practical examples will provide participants with specific guidance for their applications. The program is rounded off with contributions to the discussion on future issues in the field of plasma catalysis and the use of artificial intelligence for fast and accurate data evaluation and process control.
The event will be accompanied by the Fraunhofer Institute for Electron Beam and Plasma Technology FEP in Dresden, which will give visitors insights into practical applications during a tour and present suitable service offerings for companies.
Caption: The international workshop will be hosted by the Europäische Forschungsgesellschaft Dünne Schichten e. V. (EFDS) accompanied by the Fraunhofer FEP in Dresden, Germany (image: EFDS).
Source: EFDS
www.efds.org/en