In-vacuum film cleaning system

  The Nanocleen system
The Nanocleen system

Teknek, a UK based company specialised in contact cleaning systems , recently announced that it has introduced the world’s first contact cleaning technology for thin films that can be used in high vacuum. The Nanocleen vacuum system is said to be ideal for use in roll-to-roll production of printed electronics, and offer excellent removal of nano-scale particles that could otherwise affect product yields. It was developed as part of Clean4Yield, an EU-funded project coordinated by Holst Centre.

The company has already installed 16 systems at customer sites. It can be used in high vacuum conditions because it is the first ever silicone-free contact cleaning system, and so does not outgas. Teknek had to develop a new silicone-free adhesive and elastomer, which was carried out under the Clean4Yield project.

The project was launched in May 2012 to develop technologies for inspecting, cleaning and repairing moving foils, and so ensure cost-effective production of printed electronics. Funded through the European Union’s Seventh Framework Programme (FP7) under Grant Agreement No. 281027, Clean4Yield brings together commercial and research partners from Europe and Israel and covers the entire value chain.

<< view all news